Veeco to Participate in Nitrides Growth Symposium

Veeco Instruments Inc. announced today that it will be exhibiting and presenting at the International Symposium on Growth of III-Nitrides (ISGN4) on Wednesday, July 16-19, 2012 in St. Petersburg, Russia. The symposium is part of a biannual series focusing on the growth of III-Nitride materials, nanostructures and device structures.

Alex Gurary, Ph.D., Veeco’s Senior Director, MOCVD Hardware Test, will present “Reactants injector temperature effect on III-Nitrides materials deposition in the high speed vertical rotating disc MOCVD reactor.” Dr. Gurary has a Ph.D. in Material Science and over 20 years of experience with metal organic chemical vapor deposition (MOCVD) equipment.

Veeco’s market-leading MOCVD equipment for high brightness LED production deliver unequaled wavelength uniformity, superior footprint efficiency and a range of single and multi-reactor platforms that offer the best cost of ownership solutions in the industry.

About ISGN4
The ISGN4 symposium is organized by the Ioffe Physical-Technical Institute of Russian Academy of Sciences. Launched in Sweden in 2006, then Japan in 2008, France in 2010 and now Russia, it is the fourth symposium in a biannual series focusing specifically on growth of III-Nitride materials, nanostructures and device structures.

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