Veeco Instruments announced that it has shipped multiple TurboDisc® EPIK® 868 Gallium Nitride (GaN) Metal Organic Chemical Vapor Deposition (MOCVD) systems to several leading Chinese LED manufacturers for the production of light emitting diodes (LEDs) for solid state lighting applications.

(Image: Veeco Instruments)

Compared to previous generations, the EPIK 868 MOCVD system enables cost per wafer savings of more than 20% with a combined advantage of best operating uptime, low maintenance costs and best-in-class wafer uniformity. In addition, the system's compact architecture has the industry's best footprint efficiency for high volume LED production.

"The introduction of the lower-cost and higher-productivity EPIK 868 to the China LED market clearly demonstrates Veeco's long term commitment to this important region," commented William J. Miller, Ph.D., President, Veeco. "With the EPIK 868, our Chinese customers can continue to take advantage of Veeco's leading edge technology development and world-class service offerings at a significantly lower cost of ownership."

Based on Veeco's proven TurboDisc technology, the newly developed EPIK 868 MOCVD system offers customers a four-reactor platform for the highest productivity and a 35% footprint reduction compared to the competition. Furthermore, the wafer carrier capacity can be increased for even greater throughput per batch.

"The EPIK 868 is built upon a production proven TurboDisc platform with over one-thousand chambers installed worldwide providing the highest operating stability and efficiency for our customers," added Peo Hansson, Ph.D., Senior Vice President and General Manager, Veeco MOCVD Operations. "Not only will the new EPIK 868 system improve our customers' productivity and cost of ownership, but it will also provide a highly reliable, leading edge production tool from the MOCVD technology world leader."