2019-07-15

Taiwan-based Research Team Develops Low-temperature GaN Wafer Technology to Reduce Micro LED Production Cost

A research team led by a professor from Department of Optics and Photonics at Taiwan’s National Central University revealed a new production method for Micro LED epitaxy wafer. The team developed GaN thin film wafer under low temperature via an approach of high-energy physic. According to the researchers, the method would cost only one tenth of the current Micro LED production cost and could be applied for mass production. (Image:NCU) By combining data analysis and semiconductor manufacture process, the researchers aim to find innovative approaches for M...
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VueReal, the pioneer of MicroSolid Printing™, today announced a significant expansion of its Reference Design Kit (RDK) portfolio with new industry-specific bundles. Purpose-built for automotive and consumer electronics, the vertical RDK... READ MORE

ViewSonic Corp., a leading global provider of visual and edtech solutions, announces the shipping of LDS138-151, a 138-inch all-in-one, mobile Direct View LED Display Solution Kit. The ViewSonic LDS138-151 is a fully pre-assembled kit that bui... READ MORE