Plainview, N.Y. — Veeco Instruments Inc. (NASDAQ: VECO) today announced that the Taiwan Semiconductor Research Institute, National Applied Research Laboratories (TSRI, Narlabs) has selected Veeco’s Propel® R&D Metal Organic Chemical Vapor Deposition (MOCVD) System for advanced development and collaboration related to gallium nitride (GaN)-based power and RF devices. The single wafer Propel platform is ideal for high volume manufacturing and 300mm capabilities, as well as R&D applications. This Propel R&D syst...