AccuSputter ® AW 4450-Series Sputtering Deposition Systems

Rates shown above are given in angstroms/min/kw, and are typical only. Actual rates for any given system will depend upon process and system parameters. Rates are approximately linear with applied power except where otherwise indicated. Some materials, due to their nature, are limited to power levels substantially less than the maximum power ratings for each cathode type.

1 Insufficient data available for most materials with RF Delta operation - DC magnetron recommended for metals.

2 Ferromagnetic materials - magnetron mode is possible with thin targets only but not recommended.

3 Dielectric materials - require the use of RF power. Rates are non-linear.

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