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2014-11-21

Veeco Introduces MOCVD Platform for Efficient GaN-Based Power Devices

Veeco Instruments introduced the Propel™ Power Gallium Nitride (GaN) Metal Organic Chemical Vapor Deposition (MOCVD) system, which incorporates single-wafer reactor technology for outstanding film uniformity, yield and device performance. This new 200mm MOCVD system and technology enables the development of highly-efficient GaN-based power electronic devices that will accelerate the industry’s transition from R&D to high volume production.
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