2021-12-20

Oxford Instruments’ Atomfab ALD system production-qualified at GaN power electronics device maker

The UK’s Oxford Instruments Plasma Technology, a supplier of plasma etch and deposition high-volume manufacturing (HVM) solutions, has had its remote-plasma atomic layer deposition (ALD) nitride passivation solution qualified for full production by a US-based power electronics manufacturer of gallium nitride (GaN) devices, supporting the first phase of its ramp. GaN-based devices are now well established in the consumer market, with a wide range of rapid chargers available commercially to support mobile devices. Fast charging and a smaller footprint are among the...
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2019-01-24

Oxford Instruments Partners ITRI for Micro LED Development with Plasma Etch Solutions

Oxford Instruments Plasma Technology (OIPT) announced that it has worked with Taiwan’s Industrial Technology Research Institute (ITRI) by providing multiple PlasmaPro 100 systems including both etch and deposition for ITRI’s Micro LED R&D program. The PlasmaPro 100 ICP process solutions are designed to support leading edge device applications such as Lasers, RF, Power and advanced LEDs. ITRI has been developing Micro LED technology since 2009. In 2018, with the cooperation with Macroblock, Unimicron and PlayNitrid...
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A tiny Chip LED from ams OSRAM offers higher brightness, making it simply ideal for integration into everyday devices such as in-ear headphones or smart rings The enhanced Chip LED from ams OSRAM delivers higher brightness—while taking u... READ MORE

Introducing the XLamp® XP-LR & XP-GR Round LES LEDs Cree LED is redefining beam performance in portable lighting with the launch of the XLamp® XP-LR and XP-GR LEDs – designed specifically for directional lighting application... READ MORE