2013-09-02

Aixtron MOCVD System Used by Japanese Gas Manufacturer to Develop GaN-on-SiC-on-Si

Aixtron SE announced gas manufacturer Air Water Inc. based in Azumino, Japan has successfully installed a fully automated AIX G5 HT Planetary Reactorin a 8x6-inch configuration for the growth of GaN epitaxial layers. Following the system installation, the company has announced the release of GaN-on-SiC on silicon substrates for this year.
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Veeco Instruments Inc., a global leader in advanced semiconductor and compound semiconductor process equipment, today announced wins with Sparrow Quantum (Denmark) and Yeungnam University (South Korea), who have selected Veeco’s Molecula... READ MORE

Cree LED, a Penguin Solutions brand (Nasdaq: PENG), and SANlight GmbH, Schruns, Austria, today announced a partnership under which SANlight will use Cree LED’s J Series® products in its new STIXX-Series luminaires. Developed for appl... READ MORE