Veeco Instruments introduced the Lumina MOCVD platform, which incorporates its proprietary TurboDisc® reactor technology for film uniformity, yield and device performance for photonics applications. This new MOCVD platform, including the Lumina R480™ and Lumina R480S™ models, will accelerate the production of VCSEL, Edge-Emitting Laser (EEL) and Mini / Micro LED devices. The equipment provider brought its new products to Photonics West, starting February 4, in San Francisco.

(Image: Veeco)

According to Veeco, the new Lumina platform is designed to advance high-efficiency photonics devices including VCSELs, Mini and Micro LED production as well as EEL devices used for advanced optical communications and silicon photonics applications.

The Lumina R480 and R480S systems are based on Veeco’s industry leading MOCVD TurboDisc® technology which features excellent uniformity and low defectivity over long campaigns for exceptional yield and flexibility. In addition, Veeco’s proprietary technology drives uniform thermal control for excellent thickness and compositional uniformity. Providing a seamless wafer size transition, the system is capable of depositing high quality As/P epitaxial layers on wafers up to six inches in diameter. The R480 and R480S systems allow users to customize their systems for maximum value.