2017-06-12

Netherlands-Based Research Institute Selects USHIO's High-Intensity EUV Light Source for Research and Evaluation

The Netherlands Organization for Applied Scientific Research (hereinafter “TNO”) and USHIO INC. (HQ: Tokyo, President and CEO: Kenji Hamashima) announced that TNO opened an experimental EUV exposure and analysis facility (“EBL2”) on March 27, 2017. Through this facility, TNO provides EUV-related companies and institutions with the services to study and evaluate EUV optics as well as masks, pellicles, and sensors.
Continue reading

Nichia, the world's largest LED/Laser Diode manufacturer and inventor of high-brightness blue and white LEDs, is pleased to announce that it is currently advancing the joint development of an intravascular laser irradiation system with Ill... READ MORE

ams OSRAM, a global leader in innovative light and sensor solutions, will showcase how its latest solutions are powering game-changing applications in nearly every industry at CES 2026 in an invite-only meeting room at the Venetian Expo. Top e... READ MORE