Furukawa in Japan selects AIXTRONs MOCVD technology for the production of optoelectronic devices / AIXTRON to support development of GaAs and InP based optoelectronics in Japan

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AIXTRON

AIXTRON to support development of GaAs and InP based optoelectronics in Japan

Herzogenrath, October 18, 2022 – AIXTRON SE (FSE: AIXA), a worldwide leading provider of deposition equipment to the semiconductor industry, has received an order for an AIX 2800G4 MOCVD System from FURUKAWA FITEL OPTICAL DEVICE CO., LTD. (FFOD), a Japan based manufacturer of compound semiconductor devices. The equipment will be used for the development and the production of optoelectronic devices, based on Gallium Arsenide (GaAs) and Indium Phosphide (InP) materials.

The AIX 2800G4 platform is the established and market-leading equipment for the production of various semiconductor devices due to the unmatched performance of the Planetary Reactor® concept with respect to thickness and wavelength uniformity control of epitaxial layers. The proven system for high volume manufacturing provides highest efficiency in the use of chemicals while delivering superior yields for most advanced optical devices thanks to wafer level process control.

"We are very pleased to see Furukawa becoming one of our G4 users. The platform is the reliable and established industry standard for most demanding epitaxial requirements and has contributed to the success of many customers. With our team of hardware and process experts in Japan, we are looking forward to this new cooperation, supporting Furukawa to swiftly ramp up the platform for their existing and future products," says Dr. Felix Grawert, CEO & President of AIXTRON SE.

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